Electron energy loss processes in X-ray photoelectron spectroscopy

A technique is established in X-ray photoelectron spectroscopy (XPS), using spectra emitted from successively evaporated metallic films, to distinguish between electron energy loss mechanisms identified as, respectively, extrinsic and intrinsic to the photoelectron excitation process. It is demonstrated that tailing on the high kinetic energy side of many XPS peaks is due to intrinsic processes, while the background emission at energies generally some 30 eV below the peaks arises from extrinsic processes. Plasmon energy-loss peaks are believed to contain contributions from both intrinsic and extrinsic processes.