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AES depth profiling with N2+ ion sputtering |
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| Authors: | HM Windawi JR Katzer CB Cooper |
| Institution: | Department of Chemical Engineering, University of Delaware, Newark, Delaware 19711, USA;Department of Physics, University of Delaware, Newark, Delaware 19711, USA |
| Abstract: | Depth profiling of a polycrystalline multicomponent film using AES was compared with Ar+ and N2+ ion sputtering. The latter appears to give an improved depth resolution. |
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