Formation of microstructured silicon surfaces by electrochemical etching using colloidal crystal as mask |
| |
Authors: | Hidetaka Asoh Akihiko Oide Sachiko Ono |
| |
Institution: | aDepartment of Applied Chemistry, Kogakuin University, 1-24-2 Nishi-shinjuku, Shinjuku-ku, Tokyo 163-8677, Japan |
| |
Abstract: | Silicon disk arrays and silicon pillar arrays with a close-packed configuration having an ordered periodicity were fabricated by the electrochemical etching of a silicon substrate through colloidal crystals used as a mask. The colloidal crystals were directly prepared by the self-assembly of polystyrene particles on a silicon substrate. The transfer of a two-dimensional hexagonal array of colloidal crystals to the silicon substrate could be achieved by the selective electrochemical etching of the exposed silicon surfaces, which were located in interspaces among adjacent particles. The diameter of the tip of the silicon pillars could be controlled easily by changing the anodization conditions, such as current density and period of electrochemical etching. |
| |
Keywords: | Silicon Electrochemical etching Colloidal crystal Natural lithography |
本文献已被 ScienceDirect 等数据库收录! |