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N_2/H_2比对化学气相沉积氮化钛涂层的影响
引用本文:张林荣,张福林. N_2/H_2比对化学气相沉积氮化钛涂层的影响[J]. 北京科技大学学报, 1988, 0(3)
作者姓名:张林荣  张福林
作者单位:北京钢铁学院稀有教研室(张林荣),北京钢铁学院稀有教研室(张福林)
摘    要:本文研究了N_2/H_2比对氮化钛涂层的晶格常数、硬度、沉积速率的影响,在N_2/H_2≈1/2时得到组成近似于化学计量的氮化钛,涂层硬度和沉积速率最高,涂层模具的寿命比不涂层的可提高4倍。

关 键 词:化学汽相沉积  氮化钛  涂层  模具

Influence of Different N_2/H_2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films
Zhang Linrong,Zhang Fulin. Influence of Different N_2/H_2 Ratios by Chemical Vapor Deposition on the Performance of TiN Films[J]. Journal of University of Science and Technology Beijing, 1988, 0(3)
Authors:Zhang Linrong  Zhang Fulin
Abstract:Titanium nitride can be coated on the steel-base and cemented-carbides to improve the resistant to wear and corrosion.The effect of different N2/H2 ratios on the lattice parameter, hardness and the rate of the TiN deposition are researched in this paper. The results show that when optimum N2/H2 ratio appriximates to 0.5, the stoichiometric TiN will be formed. The hardness and the deposition rate of TiN film reach their maximum, and the lifetime of the treated surface increases by three times as compared with that of untreated ones.
Keywords:chemical vapor deposition   titanium nitride   dies   coat
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