Colossal pressure-induced negative resistance change in La2/3Ca1/3MnO3 thin films |
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| Authors: | T Roch S Yaghoubzadeh FS Razavi B Leibold R Praus H-U Habermeier |
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| Institution: | Department of Physics, Brock University, St. Catharines, L2S 3A1, Canada, CA
Max-Planck Institut für Festk?rperforschung, Heisenbergstrasse 1, Postfach 80 06 65, D-70506 Stuttgart, Germany (Fax: +49-711/689-1389, E-mail: huh@servix.mpi-stuttgart.mpg.de), DE
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| Abstract: | 2/3 Ca1/3MnO3 thin films as a function of temperature from 4 to 300 K are studied. The application of external pressure increases the temperature
of the metal–insulator transition (TMI). For a film showing TMI at about 177 K, a colossal change in resisitivity (R(0)-R(p))/R(p) qualitatively comparable to the magnetoresistance (R(0)-R(B))/R(B)
around the transition temperature, is observed. However, this change for the film with high TMI (267 K) is smaller by a factor of about 100. The increase of TMI with pressure is intimately associated with the pressure-induced contraction and alignment of Mn-O-Mn bonds and the possible
enhancement of the double-exchange interaction with pressure.
Received: 11 September 1998/Accepted: 12 September 1998 |
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| Keywords: | PACS: 74 62 Fj 61 5 Ks 72 60 +g |
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