Evaluation of CF4 plasma chemistry by power modulation |
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Authors: | L. D. B. Kiss H. H. Sawin |
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Affiliation: | (1) Chemical Engineering Department, Massachusetts Institute of Technology, Cambridge, Massachusetts |
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Abstract: | The dominant chemical reaction kinetics occurring in the plasma environment are studied by small periodic power modulation and analyzed using transfer functions. A CF4/Ar rf plasma at 500 mTorr was chosen to validate this experimental methodology because the kinetics of the CF, system have been well studied previously.(1) The experimental results demonstrated that the modulation technique can determine dominant reactions in the plasma. The experimental results also confirmed the importance of surface recombination reactions and provided quantitative total sticking coefficients for F, CF2 and CF: F=0.02, CF2=0.05, and CF0.20. The results also indicated that an activated intermediate may be a precursor to the formation of both CF2 and CF from CF4. Energetic considerations and excited-.state lifetime calculations suggest that this activated intermediate may be an internally excited CF3* radical. |
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Keywords: | rf plasma in CF4/Ar low pressure reaction kinetics power modulation |
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