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Study on optical anisotropy properties of SiO2 films with different thermal annealing temperatures |
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| Institution: | [1]Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Institute of Technical Physics, Tianjin 300192, China [2]Key Laboratory of Advanced Micro-structure Materials, Ministry of Education, Department of Physics, Tongji University, Shanghai 200092, China [3]National Key Laboratory of Science and Technology on Tunable laser, Institute of Optical-electronics, Harbin Institute of Technology, Harbin 150080, China |
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