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Modelling and optimization plasma enhanced chemical of film thickness variation for vapour deposition processes |
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| Affiliation: | [1]Changehun University of Science and Technology, School of Photo-Electronic Engineering, Changchun 130022, China [2]Thin Film Solutions Ltd, Block 7, West of Scotland Science Park, Glasgow G20 OTH, Scotland [3]Thin Film Solutions Ltd, Shanghai 201109, China |
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