Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin |
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Authors: | Bing Yu Hai–Lin Cong Hu–Wei Liu Cong-Hua Lu Fang Wei Wei-Xiao Cao |
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Affiliation: | (1) The Key Lab of Bioorganic Chemistry and Molecular Engineering of Ministry of Education, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People’s Republic of China |
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Abstract: | Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness. |
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Keywords: | DNA Diazoresin Self-assembly Micropattern |
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