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Bottom and top AF/FM interfaces of NiFe/FeMn/NiFe trilayers |
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| Authors: | V.P. Nascimento E.C. Passamani A. Biondo E. Baggio Saitovitch |
| Affiliation: | a Universidade Federal Rural do Rio de Janeiro, Instituto Multidisciplinar, Rua Professor Paris, s/n Centro, 26221-150 Nova Iguaçu, RJ, Brazil b Universidade Federal do Espírito Santo, Depto. Física, Avenida Fernando Ferrari, 514 Goiabeiras, 29075-910 Vitória, ES, Brazil c Instituto Nacional de Metrologia, Normalização e Qualidade Industrial, Avenida Nossa Senhora das Graças, 50 Duque de Caxias, 25250-020 Rio de Janeiro, RJ, Brazil d Universidade Federal de Goiás, Instituto de Física, Campus Samambaia, 74001-970 Goiânia, GO, Brazil e Centro Brasileiro de Pesquisas Físicas, Rua Dr. Xavier Sigaud, 150 Urca, 22290-180 Rio de Janeiro, RJ, Brazil |
| Abstract: | X-ray reflectivity analyses were performed in the Si/WTi (7 nm)/NiFe (30 nm)/FeMn (13 nm)/NiFe (10 nm)/WTi (7 nm) exchange-biased system prepared by magnetron sputtering under three different argon working pressures. Layer-by-layer analyses were realized in order to obtain the interfacial roughness parameters quantitatively. For a fixed argon pressure, the root-mean-square roughness (including the atomic grading) of the upper (FeMn/NiFe) interface are greater than that for the lower one in all studied samples. Argon working pressure also has severe influence over the NiFe/FeMn interfaces, being more pronounced at the upper interfaces. |
| Keywords: | 81.15.Cd 75.70.Cn 68.35.Ct 61.10.Eq |
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