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Magnetic and magnetoresistive properties of epitaxial Co/Cu/Co trilayers on Si(111)
Authors:A.V. Davydenko  Yu.P. Ivanov  L.A. Chebotkevich
Affiliation:a Laboratory of Thin Film Technologies, Far Eastern Federal University, Sukhanova 8, Vladivostok 690950, Russia
b Institute of Automation and Control Processes, Far Eastern Division, Russian Academy of Sciences, Radio 5, Vladivostok 690041, Russia
Abstract:Giant magnetoresistance of the epitaxial Co/Cu/Co trilayers grown on vicinal Si(111) was determined as a function of Cu spacer coverage in the range from 0 to 7 ML. The first maximum of giant magnetoresistance and antiferromagnetic coupling was detected at 3.0 ML coverage of the Cu spacer. The portion of antiferromagnetic coupling in the first antiferromagnetic maximum was estimated as 17%. 3D growth mode of the Cu spacer leads to the simultaneous occurrence of the ferromagnetically and antiferromagnetically coupled areas between the Co layers.
Keywords:Epitaxial multilayers   Co/Cu(111)   Growth processes   Giant magnetoresistance
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