Low pressure MOVPE of GaN and GaInN/GaN heterostructures

GaN single layers and GaInN/GaN heterostructures have been grown by low pressure metalorganic vapor phase epitaxy on sapphire substrates. We found best growth conditions and the highest growth rate for GaN to be at about 1000°C, whereas the growth rate decreased for both, higher and lower temperatures. In contrast, GaInN with a significantly high In content could only be grown at lower temperatures around 700°C. Besides growth temperature and reactor pressure, the composition of the carrier gas was found to play an important role: the In incorporation rate is about doubled when reducing the hydrogen/nitrogen ratio. GaInN/GaN quantum wells show even higher In contents compared to bulk layers.