| ICP-MS法测定电子级高纯硝酸中的金属杂质 |
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| 引用本文： | 孟蓉,李红华,黄志齐.ICP-MS法测定电子级高纯硝酸中的金属杂质[J].分析试验室,2001,20(6):67-69. |
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| 作者姓名： | 孟蓉 李红华 黄志齐 |
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| 作者单位： | 北京化学试剂研究所, |
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| 摘 要： | 用ICP-MS的不同状态（标准状态、冷等离子体技术、碰撞池技术）直接测定电子级高纯硝酸中的34个痕量金属杂质，用铟作内标可补偿基体效应，方法检出限为0.1-70ng/L，加标回收费率为90%-110%，相对标准偏差为4.0%，样品测定结果与ICP-AES测定结果基本一致。
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| 关 键 词： | 电子级高纯硝酸 IC－MS 痕量金属杂质 测定 分析 |
| 文章编号： | 1000-0720(2001)06-0067-03 |
Determination of trace metal in nitric acid of highly pruity by ICP-MS |
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| MENG Rong,LI Hong hua and HUANG Zhi qi.Determination of trace metal in nitric acid of highly pruity by ICP-MS[J].Chinese Journal of Analysis Laboratory,2001,20(6):67-69. |
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| Authors: | MENG Rong LI Hong hua and HUANG Zhi qi |
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| Abstract: | Determination of thirty four trace metal in nitric acid of highly purity with electronic degree by ICP MS with technology of standard state, plasma screen and collision cell was described. Matrix effects were compensated by adding In as internal standard. Detection limits are 0 1 to 70 ng/L with recoveries of 90 to 110%. |
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| Keywords: | Nitric acid of highly purity ICP MS Trace metal |
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