Partially and fully cured thin film photoresist waveguides for integrated optics |
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| Authors: | Gowri Arun V K Sharma A Kapoor K N Tripathi |
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| Institution: | 1. Science and Technology on Thermostructural Composite Materials Laboratory, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi''an, Shaanxi 710072, PR China;2. School of Science, Xi''an Polytechnic University, Xi''an, Shaanxi 710048, PR China;3. Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, University of Chinese Academy of Sciences, Suzhou 215123, PR China;1. Advanced Materials Group, Materials Science & Technology Division, CSIR-North East Institute of Science & Technology, Jorhat, 785006, India;2. Academy of Scientific and Innovative Research, Jorhat Campus, India;3. Biological Science & Technology Division, CSIR-North East Institute of Science & Technology, Jorhat, 785006, India;1. Polymer Membrane Laboratory, College of Science, Northeast Forestry University, Harbin, Heilongjiang 150040, China;2. Key Laboratory of Bio-Based Material Science and Technology of Ministry of Education, Northeast Forestry University, Harbin, Heilongjiang 150040, China;1. Department of Materials Engineering, College of Materials and Textile, Zhejiang Sci-Tech University, Hangzhou 310018, PR China;2. Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Zhejiang Sci-Tech University, Ministry of Education, Hangzhou 310018, PR China;3. Department of Chemistry and Key Laboratory of Biomedical Polymers of Ministry of Education, Wuhan University, Wuhan 430072, PR China;1. Department of Physics, Indian Institute of Technology Hyderabad, Kandi, 502285 Sangareddy, Telangana, India;2. Materials Physics Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102, India;3. Advanced Centre of Research in High Energy Materials (ACRHEM), University of Hyderabad, Prof. C. R. Rao Road, Gachibowli, Hyderabad 500046, Telangana, India;4. School of Physics, University of Hyderabad, Prof. C. R. Rao Road, Gachibowli, Hyderabad 500046, Telangana, India |
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| Abstract: | A systematic and detailed study of waveguide fabrication and characterization of a commercially available (from Shipley) photoresist is reported. Various waveguide properties such as refractive index, optical losses, waveguide thickness, dispersion and birefringence are reported. Effect of temperature of guide formation, curing (partial and full) and UV exposure on these parameters is also presented. |
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| Keywords: | Photoresist Waveguide Dispersion |
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