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Atomic Design of Polarity of GaN Films Grown on SiC(0001)
Authors:DAI Xian-Qi  WU Hua-Sheng  XU Shi-Hong  XIE Mao-Hai  S.Y. Tong
Affiliation:1. Physics Department, Henan Normal University, Xinxiang 453002, China;2. Physics Department, University of Hong Kong, Hong Kong, China;3. Department of Physics and Materials Science, City Universityof Hong Kong, Hong Kong, China
Abstract:Ab initio total energy calculations are used to determinethe interface structure of GaN films grown on 6H-SiC(0001) withdifferent substrate reconstructions. The results indicate thatGaN films grown on bare SiC(0001) are of the Ga-polarity, while GaNfilms grown on SiC(0001) with Si adlayer are of the N-polarityif there is no N-Si interchange at the interface. With the interchange,the GaN films are of the Ga-polarity.
Keywords:polarity   total energy calculation   adlayer   interface   
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