| Abstract: | We report for what is believed to be the first time planar waveguide formation and propagation mode reduction in Nd:YVO(4) crystal, which were achieved by 3.0-MeV silicon-ion implantation followed by annealing under specific conditions. After the implantation, an enhanced refractive-index region was formed with a width of ~2microm beneath the sample surface to act as a waveguide structure. We found that there were four propagation modes for the as-implanted Nd:YVO(4) waveguide, whereas after annealing at 240-360 degrees C for several hours the number of modes could be reduced to three, two, and one. After annealing at 400 degrees C for 1 h the monomode waveguide was destroyed completely, and no mode was observed in the sample. |
