| Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources |
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| 作者姓名： | 王凯歌 王雷 刘文清 牛憨笨 |
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| 作者单位： | [1]Institute of Optoelectronics, Shenzhen University, Shenzhen 518060 [2]Anhui Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Hefei 230031 [3]Xi＇an Institute of Applied Optics, Xi＇an 710065 |
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| 基金项目： | Supported by the National Natural Science Key Foundation of Chain under Grant No 62532090. |
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| 摘 要： | The construct and electrode potential of emitting systems are very important for the portable ultrahigh brightness microfocus x-ray sources. The ratio of Dw/H （Dw is the diameter of Wehnelt grid aperture and H is the setting height of the cathode） and the grid bias are determinative parameters for the emission current and focus properties of an electron beam. The Monte Carlo method is used to numerically calculate the electron beam trajectories within a microfocus x-ray tube. The calculated results indicate that an optimum source system with the electron beam focal spot diameter smaller than 10μm at the anode, reasonable short focal length of about 76mm and the cathode emission current of more than 30mA can be attained under conditions of Dw/H = 5 and grid bias Vg = -0.6 k V.
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| 关 键 词： | Monte Carlo学习 聚焦性 X射线源 最适应源 |
| 收稿时间： | 2006-04-03 |
| 修稿时间： | 2006-04-03 |
Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources |
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| WANG Kai-Ge, WANG Lei, LIU Wen-Qing, NIU Han-Ben.Monte Carlo Study on Focus Properties of Portable Ultrabright Microfocus X-Ray Sources[J].Chinese Physics Letters,2006,23(9):2368-2371. |
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| Authors: | WANG Kai-Ge WANG Lei LIU Wen-Qing NIU Han-Ben |
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