Hyperfine fields at implanted119Sn in Fe |
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Authors: | M B Kurup K G Prasad R P Sharma |
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Institution: | (1) Tata Institute of Fundamental Research, Homi Bhabha Road, 400 005 Colaba, Bombay, India |
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Abstract: | Metastable FeSn systems produced by high dose implantation of119Sn into Fe foils are studied by conversion electron Mössbauer spectroscopy. The hyperfine field experienced by Sn implanted in Fe depends on the implantation dose. Clustering and precipitation of Sn take place at doses of 5x1016/cm2 and beyond. Isochronal annealing of the implanted sample at 500 C causes the Sn atoms to move towards the surface, probably due to vacancy assisted migration, resulting in the precipitation of almost the entire implanted Sn on the Fe surface. This precipitate acts as a source for the in-diffusion of Sn into Fe at 600 C. |
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