Silicon and transition metal-silicides implanted with57Fe |
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Authors: | Peiqun Zhang L. Urhahn I. Dézsi A. Vantomme G. Langouche |
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Affiliation: | 1. Universit?t des Saarlandes, Werkstoffwissenschaften, D-6600, Saarbrücken, Fed. Rep. Germany 3. IKS, Katholieke Universiteit Leuven, B-3030, Heverlee, Belgium
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Abstract: | Si(111) single crystals were implanted with57Fe in a broad dose range in order to overlap the concentration range of bulk amorphous Fe x Si1−x samples. At high (≥1016 atoms/cm2) doses the measured hyperfine interaction values were found to be the same as in the bulk amorphous samples, suggesting the same Fe−Si bonding and a very similar structure for the two amorphous phases produced by different methods. A comparison of the isomer shift (δ) and quadrupole splitting (ΔE) values with the values of the stoichiometric crystalliine phases showed the same δ but different δE values indicating similar Fe−Si bonding but different atomic arrangement around the iron atom. |
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