Silicon and transition metal-silicides implanted with57Fe

Si(111) single crystals were implanted with⁵⁷Fe in a broad dose range in order to overlap the concentration range of bulk amorphous Fe _x Si_1−x samples. At high (≥10¹⁶ atoms/cm²) doses the measured hyperfine interaction values were found to be the same as in the bulk amorphous samples, suggesting the same Fe−Si bonding and a very similar structure for the two amorphous phases produced by different methods. A comparison of the isomer shift (δ) and quadrupole splitting (ΔE) values with the values of the stoichiometric crystalliine phases showed the same δ but different δE values indicating similar Fe−Si bonding but different atomic arrangement around the iron atom.