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Photodissociation of multilayered trimethylaluminum adsorbed on a cryogenic substrate: A time-of-flight mass-spectrometric study |
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| Authors: | Makoto Kobayashi Akihiko Sato Yugo Tanaka Hisanori Shinohara Hiroyasu Sato |
| Abstract: | Photodissociation of trimethylaluminum Al(CH3)3] adsorbed on a silica (SiO2) substrate at 110 K has been studied by multiphoton ionization time-of-flight mass spectrometry. Translational energy distributions of aluminum and AlCH3 fragments can be fitted with a composition of two Maxwell–Boltzmann distributions. The two components are attributed to different environments of photodissociating parent molecules in the multilayer. |
| Keywords: | Organometallics trimethylaluminum photodissociation time-of-flight mass spectrometry |