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Rough surface growth by random deposition in colloidal system |
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| Authors: | Qi-huo Wei Cai-hua Zhou Nai-ben Ming |
| Affiliation: | a National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, People's Republic of China b Department of Chemistry, Nanjing University, Nanjing 210008, People's Republic of China c National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210008, People's Republic of China |
| Abstract: | We report the study of the random deposition process in polystyrene colloidal solution film. We analysed the morphology of the formed interface and measured the scaling exponents and β, defining the interface width w(L, t) ≈ Lf(t/L/β), where f(x) ≈ 1 for x 1 and f(x) ≈ xβ for x 1, the values of which are 0.5 and 0.26, respectively. We also compared the result with the theoretical model describing the deposition process. |
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