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Si1−xGex/Si multi-quantum well phototransistor for near-infrared operation
Authors:Z. Pei   L. S. Lai   H. P. Hwang   Y. T. Tseng   C. S. Liang  M. -J. Tsai
Affiliation:Electronics Research and Service Organization, Industrial Technology Research Institute, Building 11 195-4, sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan 310, ROC
Abstract:For the first time in the literature, we report the monolithic integration of SiGe near-infrared phototransistor and planar hetero-junction bipolar transistor (HBT). The phototransistor is made with SiGe/Si multi-quantum well structure (MQW_PHT). At room temperature, the MQW_PHT reveals an optical responsivity of 1904 mW/A at 0.85 μm and 1.25 mW/A at 1.3 μm under the reversed bias of VCE=1.5 V. For electrical DC and microwave performance, the SiGe HBT has a current gain of 160 and a cut-off frequency (fT) of 25 GHz, respectively.
Keywords:Phototransistor   Multi-quantum well
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