Soft UV-nanoimprint lithography on non-planar surfaces |
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Authors: | Bahador FarshchianAlborz Amirsadeghi Steven M HurstJiahao Wu Jaejong LeeSunggook Park |
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Institution: | a Mechanical Engineering Department and Center for Bio-Modular Multiscale Systems (CBM2), Louisiana State University, USA b Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-Gu, Daejeon 305-343, Republic of Korea |
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Abstract: | We report on a simple and effective process that allows direct UV-imprinting of micro- and nanostructures on non-planar surfaces, even at sharp edges such as step surfaces. The key for the process is the use of a thin flexible polymer stamp, which was fabricated by spin-coating poly(dimethylsiloxane) (PDMS) on a pre-patterned Si or poly(methyl methacrylate) (PMMA) master and releasing the thin PDMS layer after curing. The thin PDMS stamp was used to conformally mold a UV resist layer coated on various non-planar substrates with different radii of curvature. With this method, we have successfully demonstrated micro- and nanopatterns down to 63 nm on curved surfaces as well as sharp step-like structures. The process so developed will improve the versatility and applicability of molding technologies in many applications that require patterning non-planar substrates, considering that most molding technologies allow for patterning only on planar substrates or surfaces with large curvature radii. |
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Keywords: | Nanofabrication Non-planar surfaces UV-NIL Thin PDMS stamp PMMA |
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