Substrate assisted electrochemical deposition of patterned cobalt thin films

The patterned Co layers deposited on the scratched Cu surfaces were investigated with the use of the scanning electron microscopy. Patterned cobalt thin films were electrochemically deposited from the cobalt sulfate bath at room temperature. Pattering of cobalt was carried out by simple means of substrate scratching. Gentle scratching induces a direct pattering of cobalt from vertical to horizontal. The prepared pattered films were characterized for their structural, surface morphological and compositional properties by means of X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. X-ray diffraction studies reveal that the films are of cobalt. From the SEM images fabrication of patterns of cobalt is apparent. This work demonstrates a novel approach for obtaining patterned cobalt for many technological applications.