首页 | 本学科首页   官方微博 | 高级检索  
     

THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD
引用本文:RuoyuHong JianminDing HongzhongLi. THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD[J]. 中国颗粒学报, 2003, 1(4): 162-167
作者姓名:RuoyuHong JianminDing HongzhongLi
作者单位:[1]DepartmentofChemistryandChemicalEngineenng,SoochowUniversity,Suzhou215006,P.R.China2AqereSvstems.555UnionBoulevard.Allentown.PA18109.USA [2]AclereSystems.555Union-Boulevard.Allentown,PA18109,USA [3]KeyLaboratoryofMulti-phaseReaction,InstituteofProcessEngineering,CAS,Beijing100080,P..R.China*Authortowhomcorrespondenceshouldbeaddressed.
摘    要:Silicon nitride nanoparticles were synthesized by radio-frequency (RF) plasma chemical vapor deposition (PCVD) using silicon tetrachloride and ammonia as precursors, and argon as carrier gas. By assuming chemical thermodynamic equilibrium in the system, a computer program based on chemical thermodynamics was used to calculate the compositions of the system at different initial concentrations and final temperatures. At first, five elements and thirty-four species were considered. The effects of temperatures, and concentrations of ammonia, hydrogen and nitrogen on the equilibrium compositions were analyzed. It was found that the optimal reaction temperature range should be 1200 to 1500 K to obtain the highest conversion and yield of Si3N4. The inlet position of ammonia should be lower than that of silicon tetrachloride, and both should be located at the tail of the plasma torch. The best moleratio of ammonia to silicon tetrachloride was found to be about 6. Later, the influences of water (.and oxygen) were considered, and 17 additional species were included in the computations. It was found that oxygen or water content in the raw materials should be as low as possible in order to have high nitride content in the produced Si3N4. Nitrogen or hydrogen might be used to replace some or even all the argon to improve the yield of silicon nitride and reduce the cost. The ratio of ammonia to silicon tetrachloride should be high enough to obtain high conversion, but not excessively high to reduce the oxygen content due to the existence of water in ammonia. The simulated results were verified bv experiments.

关 键 词:氮化硅 热力学分析 实验研究 PCVD 等离子体化学气相淀积 纳米颗粒 高频 合成

THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD
Ruoyu Hong,Jianmin Ding,Hongzhong Li. THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD[J]. China Particuology, 2003, 1(4): 162-167
Authors:Ruoyu Hong  Jianmin Ding  Hongzhong Li
Abstract:Silicon nitride nanoparticles were synthesized by radio-frequency (RF) plasma chemical vapor deposi-tion (PCVD) using silicon tetrachloride and ammonia as precursors, and argon as carrier gas. By assuming chemical thermodynamic equilibrium in the system, a computer program based on chemical thermodynamics was used to cal-culate the compositions of the system at different initial concentrations and final temperatures. At first, five elements and thirty-four species were considered. The effects of temperatures, and concentrations of ammonia, hydrogen and nitrogen on the equilibrium compositions were analyzed. It was found that the optimal reaction temperature range should be 1200 to 1500 K to obtain the highest conversion and yield of Si3N4. The inlet position of ammonia should be lower than that of silicon tetrachloride, and both should be located at the tail of the plasma torch. The best mole ratio of ammonia to silicon tetrachloride was found to be about 6. Later, the influences of water (and oxygen) were considered, and 17 additional species were included in the computations. It was found that oxygen or water content in the raw materials should be as low as possible in order to have high nitride content in the produced Si3N4. Nitrogen or hydrogen might be used to replace some or even all the argon to improve the yield of silicon nitride and reduce the cost. The ratio of ammonia to silicon tetrachloride should be high enough to obtain high conversion, but not exces-sively high to reduce the oxygen content due to the existence of water in ammonia. The simulated results were veri-fied by experiments.
Keywords:silicon nitride   radio-frequency (RF)   plasma   CVD   nanoparticle
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号