Photoinjection studies of ion-implantation-induced electron traps in MOS structures

Trapping centers related to P⁺ and B⁺ ions implanted in the SiO₂ layer as well as traps introduced into SiO₂ during boron implantation through the oxide into the silicon substrate have been investigated. The internal photoemission method has been used to estimate their capture cross section and total densityN_t.