Design of the aspheric Schwarzschild lens for a nanolithographer with the operating wavelength λ = 13.5 nm |
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| Authors: | N N Salashchenko A S Skryl’ M N Toropko N I Chkhalo |
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| Institution: | 1.Institute for Physics of Microstructures,Russian Academy of Sciences,Nizhni Novgorod,Russia |
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| Abstract: | The design of an aspheric Schwarzschild lens applicable to a nanolithographic test bench with an operating wavelength of 13.5
nm is discussed. Lenses with numerical apertures of 0.3 and 0.4 are examined. The influence of lens aberrations and deviations
of optical scheme parameters from rated values on the image quality is analyzed. |
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