Photoinduced structural instability of the InP (110)-(1x1) surface |
| |
Authors: | Gotoh T Kotake S Ishikawa K Kanasaki J Tanimura K |
| |
Affiliation: | Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan. |
| |
Abstract: | A scanning tunneling microscopy study reveals the removal of P and In atoms at intrinsic surface sites of InP (110)-(1x1) through an electronic mechanism under ns-laser excitation. Femtosecond nonresonant ionization spectroscopy detects desorption of P and In atoms associated directly with the bond rupture, and shows their translational energies characteristic of electronic bong breaking. The rate of P-atom removal is 4 times higher than that of In-atom removal, revealing a prominent species-dependent effect of structural instability under electronic excitation on semiconductor surfaces. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|