HfO2/SiO2高反射薄膜的应力控制技术研究

物理气象沉积的薄膜通常都有应力.为了防止高反膜应力破坏基底的面型,采用数字波面干涉仪对电子束蒸发方法制备的薄膜的应力进行了测量,并讨论了影响光学介质薄膜应力的多种因素.使用了一种交替沉积HfO2和SiO2薄膜的技术路线,HfO2薄膜作为高折射率材料体现出张应力,SiO2薄膜作为低折射率材料体现出压应力.结果表明,在稳定了很多实验条件的情况下,通过调整镀膜时的充氧量和镀膜材料的蒸发速率实现了应力的平衡;高反射薄膜有比较高的损伤阈值.

Study on stress controlling technology of HfO2/SiO2 high-refractive coating

Thin film deposited by physical vapor deposition usually has stress. In order to prevent high-refractive (HR) coating stress from destroying the surface of the substrate, the stress of the film prepared by electron beam evaporation was measured with a digital wavefront interferometer. The affecting factors of stress of optical dielectric coating were discussed. HfO2 and SiO2 were alternatively deposited on the substrate surface. As high refractive material, HfO2 layers were in tensile stress. As lower refractive material, SiO2 layers were in compressed stress. The results show that the stress is balanced by adjusting the oxygen pressure and the evaporation rate of coating material under stable experimental conditions. HfO2/SiO2 HR coatings have high damage thresholds.