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陶瓷单晶(100)基底上外延生长Pt薄膜
引用本文:赵昆,黄康权,张丽.陶瓷单晶(100)基底上外延生长Pt薄膜[J].人工晶体学报,2004,33(4):690-693.
作者姓名:赵昆  黄康权  张丽
作者单位:聊城大学物理科学与信息工程学院磁电子学实验室,聊城,252059;香港中文大学物理系,香港,新界;香港中文大学物理系,香港,新界;聊城大学物理科学与信息工程学院磁电子学实验室,聊城,252059
基金项目:theResearchFoundationofShandongProvincialEducationDepartmentofChina (No .0 3A0 5) ,ShandongScienceFundforDistinguishedYoungScientist (No .0 2BS0 50 ) ,andtheHongKongResearchGrantCouncil
摘    要:用对靶溅射技术在MgAl2O4 (100) (MAO) 和SrTiO3 (100) (STO)单晶基底上制备Pt薄膜.基底温度为700℃时,Pt薄膜外延生长为(200)取向,Pt/STO 薄膜的电阻率很低,而Pt/MAO 薄膜表现出高电阻特征.此外,Pt (50nm)/La0.67Ca0.33MnO3 (50nm)/STO的制备和研究表明,在包括庞磁电阻材料的器件设计中,Pt是一种较好的电极材料.

关 键 词:Pt薄膜  溅射  X射线衍射  原子力显微镜  庞磁电阻  

Formation of Epitaxial Platinum Films on Ceramics-(100) Single Crystal Substrates
Abstract.Formation of Epitaxial Platinum Films on Ceramics-(100) Single Crystal Substrates[J].Journal of Synthetic Crystals,2004,33(4):690-693.
Authors:Abstract
Abstract:Thin platinum (Pt) films were prepared on single-crystal substrates MgAl2O4 (100) (MAO) and SrTiO3 (100) (STO) by a facing-target sputtering technique. The films prepared at higher substrate temperature (Ts= 700℃) were grown epitaxially with (200) orientation on SrTiO3 (100) and MgAl2O4 (100). Different from the lower resistivity of Pt/STO film, Pt/MAO film shows a very higher resistivity and the temperature dependence of the resistance exhibits insulator behavior because of the pinhole formation. We also grew epitaxial Pt (50 nm)/La0.67Ca0.33MnO3 (50nm)/STO structure, indicating that Pt is a good electrode for devices involving colossal magnetoresistance materials.
Keywords:Pt film  sputtering  X-ray diffraction  atomic force microscopy  colossal magnetoresistance
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