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Ion-beam mixing kinetics of Fe-Al multilayers studied by in situ electrical resistivity measurements
Authors:J. P. Rivière  J. Delafond  C. Jaouen  A. Bellara  J. F. Dinhut
Affiliation:(1) Laboratoire de Métallurgie Physique, L.A. 131 C.N.R.S., 40, avenue du Recteur Pineau, F-86022 Poitiers, France
Abstract:The ion-beam mixing of Fe-Al evaporated multiple-layer films has been investigated by measuring continuously the electrical resistivity of the samples during the bombardment. The experimental curves exhibit a tendency toward a saturation process and allow the determination of the critical dose corresponding to the total mixing of the multiple-layer film. The variations of the volume fraction of intermixed atoms as a function of the ion dose have been deduced and a semi-empirical model is proposed to explain the observed kinetics.
Keywords:61.80  72.15  73.60
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