Ion-beam mixing kinetics of Fe-Al multilayers studied by in situ electrical resistivity measurements |
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Authors: | J. P. Rivière J. Delafond C. Jaouen A. Bellara J. F. Dinhut |
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Affiliation: | (1) Laboratoire de Métallurgie Physique, L.A. 131 C.N.R.S., 40, avenue du Recteur Pineau, F-86022 Poitiers, France |
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Abstract: | The ion-beam mixing of Fe-Al evaporated multiple-layer films has been investigated by measuring continuously the electrical resistivity of the samples during the bombardment. The experimental curves exhibit a tendency toward a saturation process and allow the determination of the critical dose corresponding to the total mixing of the multiple-layer film. The variations of the volume fraction of intermixed atoms as a function of the ion dose have been deduced and a semi-empirical model is proposed to explain the observed kinetics. |
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Keywords: | 61.80 72.15 73.60 |
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