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Basicity of siloxanes,alkoxysilanes and ethers toward hydrogen bonding
Authors:Robert West  Linda S Wilson  David L Powell
Institution:Department of Chemistry, University of Wisconsin, Madison WI 53706 U.S.A.
Abstract:Thermodynamic constants have been determined for hydrogen bonding of phenol to several siloxanes and alkoxysilanes, as well as to Me3SiSCMe3 and Me3SiSSiMe3. Alkoxysilanes are slightly weaker bases toward phenol than the isostructural ethers. Unstrained siloxanes have low values of △H for hydrogen bonding of 3.5–3.9 kcal/mol and are therefore distincatly weaker bases than either alkoxysilanes or ethers. Siloxanes with small SiOSi bond angles show increased basicity. Me3SiSCMe3 (△H 1.9 kcal/mol) and Me3SiSSiMe3 (△ 0.8 kcal/mol) are markedly less basic than dialkyl sulfides. The results are discussed using a molecular orbital model.
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