Gold particles containing plasma-polymerized styrene as an X-ray absorber

Gold particles containing plasma-polymerized styrene film were formed simultaneously by plasma polymerization and evaporation using an inductively coupled argon gas flow type reactor. Gold was used as the evaporated metal and styrene as the monomer. The plasma etching characteristics of the film were evaluated by O₂ and CO₂ plasmas using a reactor with parallel-plate electrodes. A structure of lines and spaces of 4m width was successfully fabricated in the film on Si wafer by CO₂ plasma etching through a mask pattern of plasma-polymerized resist. A self-developed pattern was obtained through the X-ray mask with polyimide substrate by synchrotron radiation. The molecular structure and atomic composition of the film were investigated by ESCA and TEM.