Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films |
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Authors: | Gu Guang-Rui and Ito Toshimichi |
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Institution: | Department of Physics, College of Science, Yanbian University, Yanji 133002, China; Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan |
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Abstract: | This paper reports that the nano-sheet carbon films (NSCFs) were
fabricated on Si wafer chips with hydrogen--methane gas mixture by
means of quartz-tube-type microwave plasma chemical vapour
deposition (MWPCVD). In order to further improve the field emission
(FE) characteristics, a 5-nm Au film was prepared on the samples by
using electron beam evaporation. The FE properties were obviously
improved due to depositing Au thin film on NSCFs. The FE current
density at a macroscopic electric field, E, of 9~V/μ m was
increased from 12.4~mA/cm2 to 27.2~mA/cm2 and the
threshold field was decreased from 2.6~V/μ m to 2.0~V/μ m
for Au-coated carbon films. A modified F-N model considering
statistic effects of FE tip structures in the low E region and a
space-charge-limited-current effect in the high E region were
applied successfully to explain the FE data of the Au-coated NSCF. |
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Keywords: | nano-sheet carbon films field
emission microwave plasma chemical vapour deposition space-charge-limited-current |
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