Effects of substrate temperature on properties of NbNx films grown on Nb by pulsed laser deposition |
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Authors: | Ashraf Hassan FarhaAli Oguz Er Yüksel UfuktepeGanapati Myneni Hani E Elsayed-Ali |
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Institution: | a Department of Electrical and Computer Engineering and the Applied Research Center, Old Dominion University, Norfolk, VA 23529, USA b Department of Physics, Old Dominion University, Norfolk, VA 23529, USA c Department of Physics, Cukurova University, Adana 01330, Turkey d Thomas Jefferson National Accelerator Facility, Newport News, VA 23606, USA |
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Abstract: | NbNx films were deposited on Nb substrate using pulsed laser deposition. The effects of substrate deposition temperature, from room temperature to 950 °C, on the preferred orientation, phase, and surface properties of NbNx films were studied by X-ray diffraction, atomic force microscopy, and electron probe micro analyzer. We find that the substrate temperature is a critical factor in determining the phase of the NbNx films. For a substrate temperature up to 450 °C the film showed poor crystalline quality. With temperature increase the film became textured and for a substrate temperature of 650−850 °C, mix of cubic δ-NbN and hexagonal phases (β-Nb2N + δ′-NbN) were formed. Films with a mainly β-Nb2N hexagonal phase were obtained at deposition temperature above 850 °C. The c/a ratio of β-Nb2N hexagonal shows an increase with increased nitrogen content. The surface roughness of the NbNx films increased as the temperature was raised from 450 to 850 °C. |
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Keywords: | 74 70 Ad 74 78 Db 74 62 Bf 79 20 Eb 61 05 cp 68 37 Ps 68 55 -a |
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