Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation |
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Authors: | Zhongdan LuXiaohong Jiang Bing ZhouXiaodong Wu Lude Lu |
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Institution: | Key Lab of Soft Chemistry and Functional Materials of Ministry of Education, Nanjing University of Science and Technology, Xiaolingwei 200, Nanjing 210094, China |
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Abstract: | Transparent Si-doped TiO2 thin films (Si-TiO2) were deposited on quartz glasses using electron beam evaporation (EBE) and annealed at different temperature in an air atmosphere. The structure and morphology of these films were analyzed by X-ray diffraction (XRD), Raman microscopy (Raman), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Meanwhile the photocatalytic activity of the films has also been evaluated on the basis of the degradation degree of rhodamine B in aqueous solution. Our experimental results suggest that the annealing temperature impact a strong effect on the structure, morphology and photocatalytic activity of Si-TiO2 thin films. Furthermore the enhanced thermal stability of Si-TiO2 films enabled them to elevate the phase transformation temperature of TiO2 from anatase to rutile and enhanced the photocatalytic efficiency. |
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Keywords: | Si doped TiO2 thin films Electron beam evaporation Annealing Photocatalytic activity |
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