Accurate calibration of TXRF using microdroplet samples |
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Authors: | L Fabry Siegfried Pahlke and Ludwig Kotz |
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Institution: | (1) Wacker Chemitronic GmbH, D-84489 Burghausen, Germany |
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Abstract: | TXRF has been applied in combination with VPD to the analysis of trace impurities in the native oxide layer of Si wafer surfaces down to the range of 108 atoms · cm–2. Proper quantification of VPD/TXRF data requires calibration with microdroplet standard reference wafers. The precision of calibration function has been evaluated and found to allow quantification at a high level of 3 confidence with microdroplet standard reference. |
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