| 数字灰度光刻成像物镜设计 |
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| 引用本文： | 陈铭勇,杜惊雷,郭小伟,马延琴,王景全.数字灰度光刻成像物镜设计[J].光子学报,2009,38(1):120-124. |
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| 作者姓名： | 陈铭勇 杜惊雷 郭小伟 马延琴 王景全 |
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| 作者单位： | 四川大学,纳米光子技术研究所,成都,610064;四川大学,纳米光子技术研究所,成都,610064;四川大学,纳米光子技术研究所,成都,610064;四川大学,纳米光子技术研究所,成都,610064;四川大学,纳米光子技术研究所,成都,610064 |
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| 摘 要： | 为了研究数字灰度光刻成像系统中栅格效应对像质的影响.在成像系统优化参量已有的研究基础上，综合考虑工作效率、光刻准确度、加工制造成本等因素，设计了一种能够有效消除数字灰度光刻成像栅格效应的光刻物镜.此光刻物镜技术指标为,数值孔径NA＝0.3，工作波长λ＝442 nm，倍率10×，分辨率R≤1.2 μm，焦深4 μm，且镜片数量少，光学加工、光学校装公差要求低.结果表明,该镜头完全满足数字灰度光刻高质量成像的需要.
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| 关 键 词： | 无掩模光刻 反射光调制器件 光刻物镜 光学设计 |
| 收稿时间： | 2007-05-31 |
| 修稿时间： | 2007-10-22 |
Design of Digital Gray-tone Lithography Lens |
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| CHEN Ming-yong,DU Jing-lei,GUO Xiao-wei,MA Yan-qing,WANG Jing-quan.Design of Digital Gray-tone Lithography Lens[J].Acta Photonica Sinica,2009,38(1):120-124. |
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| Authors: | CHEN Ming-yong DU Jing-lei GUO Xiao-wei MA Yan-qing WANG Jing-quan |
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| Institution: | Nano Photonics Research Technology Institute;Sichuan University;Chendu 610064;China |
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| Abstract: | Based on the established research results of digital gray-tone lithography imaging system,taking some effects such as work efficiency,resolution,cost for fabrication,and so on into account,a lithography lens which can effectively remove the image pixel structure was designed.The technical data are as follows:numerical aperture is 0.3,work wavelength is 442 nm,ratio is 10×,work resolution is 1.2 μm,depth of focus is 4μm,and less elements,low requirement for tolerance in fabrication and assemblage.The result shows that the lens can sufficiently meet the requirement of high-quality imaging in digital gray-tone lithography. |
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| Keywords: | Maskless lithography DMD Lithography lens Optical designing |
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