| 9—46keV电子引起的Ni的K壳层电离截面 |
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| 引用本文： | 何福庆,龙先灌,彭秀峰,刘慢天. 9—46keV电子引起的Ni的K壳层电离截面[J]. 原子与分子物理学报, 1994, 0(2) |
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| 作者姓名： | 何福庆 龙先灌 彭秀峰 刘慢天 |
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| 作者单位： | 四川大学原子核科学技术研究所 |
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| 摘 要： | 用Ｓｉ（Ｌｉ）探测器测量薄Ｎｉ靶在９—４６ＫｃＶ的电子轰击下产生的Ｋ壳层特征Ｘ射线，以确定其Ｋ壳层电子的电离截面。测量结果与前人的实验和理论计算以及经验公式的计算结果作了比较。
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K-IONIZATION CROSS SECTIONS OF THE NICKEL ATOM BY 9-46 keV-ELECTRON IMPACT |
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| He fuqing, Long Xianguan, Peng Xiufeng and Liu mentian. K-IONIZATION CROSS SECTIONS OF THE NICKEL ATOM BY 9-46 keV-ELECTRON IMPACT[J]. Journal of Atomic and Molecular Physics, 1994, 0(2) |
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| Authors: | He fuqing Long Xianguan Peng Xiufeng Liu mentian |
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| Abstract: | In this paper, K-ionization cross sections of Ni by electron impact (impact energy 9 46keV) was measured detecting characteristic X-ray emitted by thin solid film targets of knowh mass thickness with a Si(Li) detector. The experimental results are compared with previous and theoretical calculations and empirical formula calculstions. |
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| Keywords: | Electron impact Characteristic X-ray Ionization cross section. |
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