High energy electron radiation effect on Ni and Ti/4H-SiCSchottky barrier diode at room temperature |
| |
Authors: | Zhang Lin Zhang Yi-Men Zhang Yu-Ming Han Chao and Ma Yong-Ji |
| |
Institution: | Microelectronic School, Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China |
| |
Abstract: | This paper reports that Ni and Ti/4H-SiC Schottky barrier diodes
(SBDs) were fabricated and irradiated with 1~MeV electrons up to a
dose of $3.43\times10^{14}$~e/cm$^{2}$. After radiation, the Schottky
barrier height $\phi _{\rm B} $ of the Ni/4H-SiC SBD increased from
1.20~eV to 1.21~eV, but decreased from 0.95~eV to 0.94~eV for the
Ti/4H-SiC SBD. The degradation of $\phi _{\rm B} $ could be
explained by interface states of changed Schottky contacts. The
on-state resistance $R_{\rm S}$ of both diodes increased with the
dose, which can be ascribed to the radiation defects. The reverse
current of the Ni/4H-SiC SBD slightly increased, but for the Ti/4H-SiC
SBD it basically remained the same. At room temperature,
$\phi _{\rm B} $ of the diodes recovered completely after one week,
and the $R_{\rm S}$ partly recovered. |
| |
Keywords: | silicon carbide Schottky
barrier diode electron radiation annealing effect |
本文献已被 维普 等数据库收录! |
| 点击此处可从《中国物理 B》浏览原始摘要信息 |
| 点击此处可从《中国物理 B》下载免费的PDF全文 |
|