| 双咪唑光敏体系紫外光引发聚合甲基丙烯酸甲酯动力学和应用研究 |
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| 引用本文： | 徐锦棋,高放,杨永源,李立东,冯树京.双咪唑光敏体系紫外光引发聚合甲基丙烯酸甲酯动力学和应用研究[J].影像科学与光化学,1999,17(3):247-252. |
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| 作者姓名： | 徐锦棋 高放 杨永源 李立东 冯树京 |
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| 作者单位： | 中国科学院感光化学研究所, 北京100101 |
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| 摘 要： | 用光敏剂4,4′ 二(N,N′ 二甲基-氨基)苯甲酮(简称米氏酮,MK)、引发剂邻氯代六芳基双咪唑(o-Cl-HABI)和氢给体助引发剂十二烷基硫醇(SH)组成光敏引发体系。研究了在高压汞灯照射下,甲基丙烯酸甲酯(MMA)光聚合速率和该敏化体系每一个组分,包括MK、o-Cl-HABI、SH和MMA的关系,还研究了该体系在PS版材上的应用,并获得了很好的效果。
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| 关 键 词： | 双咪唑 光聚合 光敏引发体系 |
| 收稿时间： | 1998-09-10 |
KINETIC AND APPLIED STUDY OF UV LIGHT PHOTOSENSITIVE INITIATING POLYMERIZATION OF METHYLMETHACRYLATE BY BIIMIDAZOLE PHOTOSENSITIVE SYSTEM |
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| XU Jinqi,GAO Fang,YANG Yongyuan,LI Lidong,FENG Shujing.KINETIC AND APPLIED STUDY OF UV LIGHT PHOTOSENSITIVE INITIATING POLYMERIZATION OF METHYLMETHACRYLATE BY BIIMIDAZOLE PHOTOSENSITIVE SYSTEM[J].Imaging Science and Photochemistry,1999,17(3):247-252. |
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| Authors: | XU Jinqi GAO Fang YANG Yongyuan LI Lidong FENG Shujing |
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| Institution: | Institute of Photographic Chemistry, The Chinese Academy of Sciences, Beijing 100101, P.R. China |
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| Abstract: | The ultraviolet photosensitive initiating system is composed of
4,4'bis(N,N'dimethylamino) benzophenone (MK), 2chlorohexaarylbiimidazole (oClHABI) and a
hydrogen donor coinitiator ndodecyl mercaptan (SH). Under the irradiation by high pressure
mercury lamp, the relationship between the photopolymerization rate of MMA and the
concentration of each component of the system, including MK, oClHABI, SH and MMA, was
studied. The excellent results have been obtained through studying the system's application on
PS printing plate.\= |
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| Keywords: | biimidazole photopolymerization photosensitive initiating system |
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