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The dielectric breakdown of anodic aluminum oxide |
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| Authors: | H.J. De Wit C. Crevecoeur |
| Affiliation: | Philips Research Laboratories, Eindhoven, The Netherlands |
| Abstract: | The dielectric breakdown field of anodic oxide layers on aluminum is independent of thickness in the region 230- 1700 Å and is close to the forming field. |
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