Vacuum arc deposition of carbon thin films in a low pressure ofhydrogen

Results on the vacuum arc deposition (VAD) of thin carbon films on silicon, tungsten, and nickel are presented for different hydrogen pressures in the arc chamber. Raman and Auger electron spectroscopy and SEM analysis show that a large variety of film structures can be obtained. Highly oriented pyrolytic graphite is formed at high hydrogen pressure and low substrate temperature. Vacuum deposition resulted in a diamondlike structure. Evidence of the presence of multicrystalline spheres of diamond in some films is also presented