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Comparative analysis of nanostructured diblock copolymer films
Institution:1. Department of Electronics and Communication, IIIT Kurnool, Off Vandalur-Kelambakkam Road, Nellikuppam Chennai, T.N. 600127, India;2. School of Computing and Electrical Engineering, IIT Mandi, HP 175005, India;3. Electronics & Electrical Communication Engineering, IIT Kharagpur, W.B. 721302, India
Abstract:Nanostructured polymer films of poly(styrene-block-paramethylstyrene) diblock copolymers P(Sd-b-pMS) on silicon substrates with a native oxide layer are investigated. Resulting from a storage under toluene vapor, a surface structure is installed. The early stages, characterized by the creation of a host structure out of an initially continuous film, are addressed. Grazing incidence small-angle X-ray scattering (GISAXS) experiments were performed as a function of exposure time. Results are compared to modelling of the scattering pattern and other experimental techniques, such as grazing incidence small-angle neutron scattering (GISANS) and atomic force microscopy (AFM) data. Possibilities and limits of the techniques are discussed.
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