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Post-Assembly Photomasking of Potassium Acyltrifluoroborates (KATs) for Two-Photon 3D Patterning of PEG-Hydrogels |
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| Authors: | Haewon Song Dino Wu Dimitry Mazunin Sizhou M. Liu Yoshikatsu Sato Nicolas Broguiere Marcy Zenobi-Wong Jeffrey W. Bode |
| Affiliation: | 1. Laboratorium für Organische Chemie, Department of Chemistry and Applied Biosciences, ETH Zürich, CH-8093 Zürich, Switzerland;2. Institute of Transformative Bio-Molecules, Nagoya University, Nagoya, Aichi, 464-8601 Japan;3. Tissue Engineering and Biofabrication Laboratory, Department of Health Sciences & Technology, ETH Zürich, CH-8093 Zürich, Switzerland |
| Abstract: | Chemical ligation reactions of functional groups that can be masked with two-photon labile protecting groups provide a powerful technology for the three-dimensional patterning of molecules – including proteins – onto hydrogel scaffolds. In order to utilize readily prepared hydrogels constructed by the potassium acyltrifluoroborate (KAT)-hydroxylamine amide formation ligation for two-photon patterning, we have developed a unique post-polymerization protecting group strategy through the reaction of KATs and dithiols in water and deprotection by two-photon excitation. After precise 3D spatially confined light irradiation, the unprotected KATs undergo ligations with hydroxylamine-functionalized superfolder GFP and sulforhodamine B for the composition of three-dimensional patterns. |
| Keywords: | 3D photopatterning hydrogel KAT ligation photochemistry protecting groups |