Application of total-reflection X-ray fluorescence spectrometry in material analysis |
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| Authors: | Peter Hoffmann Martin Kein Volker Scheuer Karl Heinrich Lieser |
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| Institution: | (1) Fachbereich Anorganische Chemie und Kernchemie, Technische Hochschule Darmstadt, D-6100 Darmstadt, Federal Republic of Germany;(2) Fachbereich Physik, Technische Hochschule Darmstadt, D-6100 Darmstadt, Federal Republic of Germany |
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| Abstract: | X-ray fluorescence spectrometry with total reflection conditions is applied in the qualitative and quantitative determination of impurities in thin layers of Ti, TiO2, and HfO2 prepared by evaporation and of SiO2, TiO2, and Ta2O5 prepared by ion beam sputtering. The same method is used to examine stainless steel discs, which have to be used as reference materials,Dedicated to Professor Günther Tölg on the occasion of his 60th birthday |
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| Keywords: | X-ray fluorescence total reflection thin films analysis |
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