NMR investigation of concentrated alumina and silica slurries |
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Authors: | Raymond Mackay Jie Zhang Qi Wu Yuzhuo Li |
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Affiliation: | Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699, USA |
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Abstract: | The longitudinal relaxation times (T1) of water in concentrated silica and alumina slurries were measured as a function of solids content. It was shown that the results could be fit very well with a two-phase fast-exchange model between free and surface-bound water. As expected, values of T1 for bound water were in the order of 20–2000 times lower than that for free water, indicating a higher effective viscosity of the surface-bound water. The strength of the interaction depended on the particular surface, and all of the aluminas examined interacted more strongly with water than the two silicas studied, which themselves differed considerably. The chemical mechanical polishing (CMP) removal rate of tantalum by silica slurries was shown to be directly correlated with the interaction parameters, derived from the NMR relation times rather than with total surface hydroxyl group concentration. |
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Keywords: | Alumina and silica slurries Relaxation time Dynamic NMR Chemical mechanical polishing |
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