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背面曝光技术制作沙漏状X射线组合折射透镜
引用本文:朱艳青,梁静秋,梁中翥,黄鑫华,乐孜纯,伊福廷,侯凤杰,黄万霞,董文,王维彪,王志立,崔乃迪.背面曝光技术制作沙漏状X射线组合折射透镜[J].物理学报,2009,58(3):1526-1530.
作者姓名:朱艳青  梁静秋  梁中翥  黄鑫华  乐孜纯  伊福廷  侯凤杰  黄万霞  董文  王维彪  王志立  崔乃迪
作者单位:(1)浙江工业大学,杭州 310032; (2)中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,长春 130033; (3)中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,长春 130033;中国科学院研究生院,北京 100049; (4)中国科学院高能物理研究所,北京 100049
基金项目:国家自然科学基金(批准号:60672014 ),北京正负电子对撞机国家实验室用户项目资助的课题.
摘    要:在分析沙漏状X射线组合折射透镜(X-ray compound refractive lens,XCRL)的折射聚焦理论的基础上,设计并利用背面曝光技术制作了SU-8材料的沙漏状XCRL,该技术在保证图形准确性的同时减少了工艺步骤,使制作更加简便易行.在10?keV单色X射线辐射下,对制作的透镜进行了聚焦性能的实验测试,结果表明,所制作的透镜较好地实现了一维聚焦. 关键词: 组合折射透镜 背面曝光 沙漏状 SU-8

关 键 词:组合折射透镜  背面曝光  沙漏状  SU-8
收稿时间:2008-04-21
修稿时间:8/4/2008 12:00:00 AM

Hourglass-shaped X-ray compound refractive lens made by back-mask exposure technology
Zhu Yan-Qing,Liang Jing-Qiu,Liang Zhong-Zhu,Huang Xin-Hua,Le Zi-Chun,Yi Fu-Ting,Hou Feng-Jie,Huang Wan-Xia,Dong Wen,Wang Wei-Biao,Wang Zhi-Li,Cui Nai-Di.Hourglass-shaped X-ray compound refractive lens made by back-mask exposure technology[J].Acta Physica Sinica,2009,58(3):1526-1530.
Authors:Zhu Yan-Qing  Liang Jing-Qiu  Liang Zhong-Zhu  Huang Xin-Hua  Le Zi-Chun  Yi Fu-Ting  Hou Feng-Jie  Huang Wan-Xia  Dong Wen  Wang Wei-Biao  Wang Zhi-Li  Cui Nai-Di
Abstract:Using back-mask exposure technology,the hourglass-shaped X-ray compound refractive lens (XCRL) was made. Firstly,the theory of the refractive focusing of the hourglass-shaped XCRL was analyzed. Then the hourglass-shaped XCRL was manufactured using back-mask exposure technology for the first time,which avoids two-time masking and reduces the transfer times of the figure. The refractive focusing performance of the lens was tested with 10?keV monochromatic X-ray. The experimental results indicated that it has good focusing performance in one dimension, which is in general coincident with the calculated results.
Keywords: compound refractive lens (CRL) back-mask exposure hourglass shape SU-8
Keywords:SU-8
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