Magnetic linear dichroism studies of in situ grown NiO thin films |
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| Authors: | S.R. Krishnakumar M. Liberati C. Grazioli M. Veronese S. Turchini P. Luches S. Valeri C. Carbone |
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| Affiliation: | 1. International Centre for Theoretical Physics (ICTP), Strada Costiera 11, 34100 Trieste, Italy;2. Dipartimento di Fisica, Universita di Modena e Reggio Emilia, Via Campi 213/a, 41100 Modena, Italy;3. INFM–National Center on nanoStructures and bioSystems at Surfaces (S3), Via Campi 213/a, 41100 Modena, Italy;4. Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche, Area Science Park, I-34012 Trieste, Italy |
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| Abstract: | We report thickness dependence of magnetic linear dichroism (MLD) of in situ grown NiO(0 0 1) films on Ag(0 0 1) substrate at the Ni L2 absorption edge. Antiferromagnetic domains at the surface of NiO(0 0 1) films are found to be preferentially aligned in-plane. For films thinner than a critical thickness tc (20–40ML), we observe a softening of the in-plane magnetic domain alignments with increasing film thickness, arising from the strain-relaxation effects. Films thicker than tc exhibits a residual in-plane anisotropy, possibly related to the finite-thickness effects. |
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| Keywords: | 75.25.+z 75.50.Ee 75.30.Gw 75.70.&minus i |
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